Filtering half mask OXY X 210 FFP2 R D

Filtering half mask OXY X 210 FFP2 R D/ OXYLINE. Complies with PN-EN 149+A1:2010 (Respiratory protective devices - Filtering half masks to protect against particles. Requirements, testing, marking). The filtering half mask X 210 V FFP2 R D is designed to protect the respiratory system against solid particle aerosols, water-based aerosols (dust, smoke) and aerosols with a liquid dispersed phase (mists) for which the OEL is ?0.05 mg/m3, provided the concentration of the dispersed phase does not exceed 10 x OEL. The half mask is designed so that it is easy to breathe in throughout the whole work shift (8 hours). Thanks to the anatomical shape and the nose clip located underneath in the foam, the half mask is easy to fit to most face shapes so as to ensure the necessary seal. EXAMPLE APPLICATIONS: moderately toxic solid particles, dusts of asbestos, copper, barium, titanium, vanadium, chromium, manganese, hardwood dust, coal dust containing free silica above 10%, mining, chemical and metallurgical industries, hardwood processing. CHARAKTERYSTYKA/ KONSTRUKCJA MASKI Multi-layer filter material: polypropylene Nose clip for shaping the half mask around the nose Plastic exhalation valve Head strap made of braided rubber threads Head strap fastenings made of plastic Nose seal made of polyurethane foam